[8p-N105-1~8] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

2:45 PM - 3:00 PM JST(5:45 AM - 6:00 AM UTC)

[8p-N105-6] Fabrication and Characterization of Metal Oxide Films Using Mist CVD

〇Kaoru Hamada¹, Yoshihiro Ichinohe¹ (1.HUS Grad.Eng.Elect.Eng)

Keywords:

mist cvd