Presentation Information
[8p-P10-13]Mist CVD Growth of Cu-doped a-In2O3 and Its Electrical characterization
〇(M1)Tarou Iizuka1, Ryo Ishikawa1, Haruki Ishikawa1, Hiroki Nagai1, Takeyoshi Onuma1, Tohru Honda1, Tomohiro Yamaguchi1 (1.Kogakuin university)
Keywords:
indium oxide,Mist CVD method,doped