[8p-P10-1~49] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[8p-P10-5] Development of a Mist CVD system for fabrication of uniform thin film at high temperatures under atmospheric pressure

〇Toshiyuki Kawaharamura¹, Masahiko KOMATSU¹, Tatsuya YASUOKA¹, Htet Su WAI¹, Abhay Kumar MONDAL¹, Ryosuke OHASHI¹, Tatsuki OKADA¹, Yuya SATO², Hiroshi OHKUBO² (1.Kochi Univ. of Tech., 2.Toyo Tanso Co., Ltd.)

Keywords:

mist CVD,carbon reactor,Atmospheric pressure and high temperature