Presentation Information
[8p-P10-7]Effect of deionized water mist mixture on In2O3 deposition using Mist CVD
〇Haruki Ishikawa1, Tomohiro Yamaguchi1, Ryo Ishikawa1, Taro Izuka1, Sinya Aikawa1, Takeyoshi Onuma1, Tohru Honda1 (1.Kogakuin univ.)
Keywords:
Thin Film Growth,Mist CVD,In2O3
In2O3 thin films were deposited by Mist CVD method, and the growth rate and thickness distribution were controlled by mixing pure water mist. The film thickness decreased and the in-plane thickness uniformity improved with the supply of pure water, indicating that mixing pure water during deposition is effective in controlling growth and improving thickness uniformity.