[9a-N401-1~11] CS.9 Code-sharing session of 6.5&7.5

9:15 AM - 9:30 AM JST(12:15 AM - 12:30 AM UTC)

[9a-N401-2] Fabrication of Silicon Nanostructures Using AFM Lithography and 2-Dimensional Carbon Materials Assisted Etching

〇(M2)Yuki Miura¹, Toru Utsunomiya¹, Takashi Ichii¹ (1.Kyoto Univ.)

Keywords:

etching,semiconductor,lithography

Carbon-assisted etching has been reported as one of the semiconductor surface microfabrication techniques. In order to fabricate nanostructures using this method, a precise patterning technique of catalyst materials at specific locations is required. A lithography technique using an atomic force microscope (AFM) has also been developed as a microfabrication technique for carbon materials. In this study, we aimed to fabricate silicon nanostructures by combining these two techniques, carbon material assisted etching and AFM lithography.