Presentation Information
[9a-N401-8]Synthesis of N-doped DLC using Photo-emission Assisted Plasma CVD
〇(M1C)Yulin Yan1, Satoshi Seki1, Shuichi Ogawa1 (1.Nihon Univ.)
Keywords:
Diamond-Like Carbon,photoemission-Assisted Plasma CVD,Raman spectroscopy
We investigated the deposition conditions of nitrogen-doped DLC (N-DLC) films, which are attracting attention as gate insulator films for graphene FETs, using photoelectron controlled plasma CVD by employing glow discharge and Townsend discharge while varying the N2flow rate. The results revealed differences in deposition efficiency and DLC formation depending on the discharge mode. Notably, in Townsend discharge, the CH4 dissociation efficiency decreased due to the influence of N2, which suggested that film deposition becomes difficult.