Presentation Information
[9p-N101-5]Latest Trends in Epitaxial Growth and Silicon Substrates for Beyond 2nm Technology Node
〇Atsushi Ogura1,2, Koji Usuda2 (1.Sci.and Tech., Meiji Univ, 2.MREL, Meiji Univ.)
Keywords:
SiGe epitxy,Si(110) wafer
SiGe epitxy,Si(110) wafer