Presentation Information

[9p-N101-5]Latest Trends in Epitaxial Growth and Silicon Substrates for Beyond 2nm Technology Node

〇Atsushi Ogura1,2, Koji Usuda2 (1.Sci.and Tech., Meiji Univ, 2.MREL, Meiji Univ.)

Keywords:

SiGe epitxy,Si(110) wafer