[9p-N103-1~12] Advances in Soft X-ray Multilayer Optics for Short-Wavelength Beyond EUV Lithography

5:05 PM - 5:20 PM JST(8:05 AM - 8:20 AM UTC)

[9p-N103-10] Beyond EUV Measurement Tools at NewSUBARU Synchrotron Light Facility

〇Tetsuo Harada¹, Tomoya Tanagi¹, Naoki Hayase¹, Shinji Yamakawa¹ (1.Univ. of Hyogo)

Keywords:

Beyond EUV Lithography,NewSUBARU Synchrotron Light Facility

To support the development of Beyond EUV (BEUV) lithography, NewSUBARU Synchrotron Light Facility has been developing measurement tools for the 6.7 nm wavelength region, including a reflectometer, sensitivity measurement system, and interference lithography setup. A high-order light suppression mechanism enables precise reflectivity measurements, facilitating the evaluation and development of stable multilayer mirrors such as C/B systems. These tools provide a technical foundation for advancing BEUV lithography.