Presentation Information
[9p-N103-5]Efficient laser-produced plasma extreme ultraviolet (EUV) source
〇Takeshi Higashiguchi1 (1.Utsunomiya Univ.)
Keywords:
EUV,laser-produced plasma
As EUV lithography tools become higher NA, EUV sources are required to have higher output power and higher efficiency. Because CO2 lasers (gas lasers) consume large amounts of power, there is a movement to replace the pumping laser with a mid-infrared solid-state laser in the 2 µm band for current EUV light sources used in lithography. We have attempted to improve efficiency by developing a new laser irradiation method. In this presentation, we report on the improvement of energy conversion efficiency using the multi-beam irradiation method and the enhancement of spectral purity (spectral efficiency) through the oblique incidence method.