[9p-N103-1~12] Advances in Soft X-ray Multilayer Optics for Short-Wavelength Beyond EUV Lithography

3:55 PM - 4:10 PM JST(6:55 AM - 7:10 AM UTC)

[9p-N103-6] Characteristics of laser-produced beyond EUV and water-window soft x-ray sources

〇Takeshi Higashiguchi¹ (1.Utsunomiya Univ.)

Keywords:

EUV,water-window,laser-produced plasma

Currently, beyond EUV (B-EUV) study is underway, although it depends on progress in achieving high numerical aperture (NA) in 13.5 nm lithography. A water window soft X-ray source, so-called “Blue-X” as a short-wavelength EUV light source, is also being considered. We have been working on improving the efficiency of laser-produced plasma B-EUV light sources and water-window soft X-ray sources. In this presentation, we report on the narrowing of the spectrum of the laser-produced plasma B-EUV source to match the spectral bandwidth and a two-hour continuous experiment of the water-window soft X-ray source near 4 nm.