[9p-N103-1~12] Advances in Soft X-ray Multilayer Optics for Short-Wavelength Beyond EUV Lithography

4:50 PM - 5:05 PM JST(7:50 AM - 8:05 AM UTC)

[9p-N103-9] Grazing-Incidence Multilayer Mirrors for Imaging Objective in 400 eV Region

Shuntaro Waki¹, Tetsuo Harada², 〇Mitsunori Toyoda¹ (1.Tokyo Polytechnic Univ., 2.Univ. of Hyogo)

Keywords:

multilayer mirror,water window

The present study reports the results of an investigation and the fabrication of multilayer mirrors that has been designed to be suitable for the 400 eV (wavelength 3.1 nm) region for grazing incidence optical systems. In conditions of photon energy E = 397 eV and incident angle φ = 60°, three material pairs (Sc/Si, Sc/Mg, Sc/Cr) were prototyped using a magnetron sputtering apparatus, the expectation being that these would exhibit high reflectivity.Subsequently, the reflectance spectra of the three mirrors were measured using a soft X-ray reflectometer installed at the NewSUBARU synchrotron facility. The Sc/Cr multilayer mirror demonstrated a high reflectance of R = 34% at a wavelength of 3.1 nm.