Presentation Information
[9p-N105-10]Fabrication of rutile-type GeO2 films on glass substrates under high pressure
〇Keiji Shibata1, Fumio Kawamura2, Masahi Miyakawa2, Hitosi Yusa2, Naoomi Yamada1 (1.Chubu Univ., 2.NIMS)
Keywords:
rutile-type GeO2,high pressure,crystallization