Presentation Information

[9p-N323-9]Fabrication of wurtzite-type ZnO1-xSx thin films via reactive sputtering with sulfur plasma

〇(D)Daiki Daiki Motai1, Issei Suzuki1, Taichi Nogami1, Hitoshi Tampo2, Takehiko Nagai2, Norio Terada2, Masami Aono3, Takahisa Omata1 (1.Tohoku Univ., 2.AIST, 3.Kagoshima Univ.)

Keywords:

Reactive sputtering,Sulfur plasma,Solid solution