[9p-N324-1~19] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

2:00 PM - 2:15 PM JST(5:00 AM - 5:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[9p-N324-3] Control of Magnetic Field Distribution around the Cathode and AlCr Cathode Spot Motion in a High-Rate Filtered Arc Deposition System

〇Mirano Oneda¹, Genki Sano¹, Shogo Ochi¹, Haru Sano¹, Hirofumi Takikawa¹, Hiroaki Sugita², Takahiro Hattori², Hiroki Gima² (1.Toyohashi Univ. Technol., 2.OSG Corp.)

Keywords:

Steered arc,AlCrN,vacuum arc deposition

In order to fabricate droplet-free AlCrN films, the stead (Steered arc) method is used to reduce droplets by preventing overheating of the cathode by rotating the cathode point on the cathode at high speed. In this study, magnetic field measurements were carried out with the aim of changing the cathode point running position. As a result, it was confirmed that the magnetic field distribution near the cathode changed. Since the position of the balance point of the magnetic field on the cathode surface could be changed, it is thought that the running radius can be reduced.