Presentation Information
[9p-P09-9]Production of rotational magnetron RF sputtering plasma for improving target utilization
〇(M1)Masato Komori1, Otsu Yasunori1 (1.Saga Univ)
Keywords:
plasma,sputtering
In recent years, the demand for semiconductor devices has been increasing year by year due to the progress of digital transformation and the expansion of data centers. Magnetron sputtering is widely used as a thin film synthesis method in semiconductor devices. However, there is an issue that the material target is not used effectively, and the material target utilization rate is low at 20% to 30%. Therefore, this research aims to improve the target utilization rate by adopting a rotating magnet type instead of the conventional fixed magnet type.