[14a-K507-1~9] CS.5 Code-sharing Session of 6.5 & 7.5

11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)

[14a-K507-8] Reaction rate enhancement of SiO₂/Si(001) interface oxidation by switchng O₂ exposure ON-OFF

〇Yasutaka Tsuda¹, Akitaka Yoshigoe¹, Yuki Okabe², Hengyu Wen², Shuichi Ogawa², Yuji Takakuwa^1,3 (1.JAEA, 2.Nihon univ., 3.Tohoku univ.)

Keywords:

silicon,oxidation,X-ray photoemission spectroscopy