Presentation Information

[14a-K507-9]Bayesian Estimation for Analyzing Si 2p XPS of Oxidized Silicon Surfaces

〇Hiroshi Shinotsuka1, Kenji Nagata1, Hideki Yoshikawa1, Shuichi Ogawa2, Akitaka Yoshigoe3 (1.NIMS, 2.Nihon Univ., 3.JAEA)

Keywords:

Bayesian estimation,Statistical analysis,Silicon surface oxidation

We analyzed Si 2p spectra measured during the silicon oxidation process using Bayesian estimation with X-ray Photoelectron Spectroscopy (XPS). This approach reduces dependency on initial values in optimization and enables exploration of global optimal solutions. As a result, we achieved automated analysis comparable to that of experts, successfully estimating the number and positions of spectral peaks from posterior distributions and clearly observing changes in each spectral component during the oxidation process.

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