Presentation Information

[15a-K307-11]Improvement of thermal resistance of organic monolayers by molecular level sealing structures

〇(M2)Sae Mitamura1, Sho Nekita2, Takeshi Ono1, Takuro Hosomi1, Jiangyang Liu1, Wataru Tanaka1, Tsunaki Takahashi1, Tetsuya Okuyama2, Satoshi Hata2, Takeshi Yanagida1,3 (1.Univ. Tokyo Eng., 2.IGSES Kyushu Univ., 3.IMCE Kyushu Univ.)

Keywords:

Nanowires,Organic-Inorganic hybrid material,ALD

This study developed a method for the formation of metal oxide protective layers by nm-scale ALD that improves the thermal stability of organic molecules and identified the mechanism by which oxygen promotes their thermal decomposition. The method successfully stabilised molecules at 300°C in air and under O2 plasma conditions, outperforming conventional methods. In particular, Al2O3 formed a dense amorphous film and showed high heat resistance due to oxygen deprivation, as observed by 4DSTEM.

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