Presentation Information
[15p-K401-15]Efficiency Analysis of 230 nm far-UVC LED either grown on Bulk AlN or c-Sapphire as a Function of Quantum-well Numbers
〇(P)Muhammad Nawaz Sharif1, Kohei Fujimoto1,3, Yuya Nagata1,3, Hiromitsu Sakai2, Hiroyuki Yaguchi3, Yukio Kashima4, Muhammad Ajmal Khan1, Hideki Hirayama1 (1.RIKEN, 2.Shin-Etsu Chemical, 3.Saitama University, 4.Marubun Corporation, Chuo, Tokyo)
Keywords:
III-V nitrides semiconductors,AlGaN-based Light emitting Diode
AlGaN-based 230 nm-band far-ultraviolet-C (far-UVC) light sources can safely be used as a germicidal application in both manned as well as unmanned environments against any viruses and microbes including SARS-CoV-2 and bacteria methicillin-resistant Staphylococcus aureus (MRSA). Previously, the 230 nm far-UVC LED grown on c-sapphire with an emission power of 3 mW and the external quantum efficiency (EQE) of 0.4% on the wafer was reported by our Lab, however, the multi quantum-well (MQWs) was not optimized in the context of relaxation ratios. The low relaxation ratio underneath the MQWs is critical for suppressing transverse magnetic (TM)-mode emission and promoting transverse electric (TE)-mode emission. Therefore, herein, we conducted a systemic analysis on optimizing QW numbers for 230 nm far-UVC LED while considering various degrees of relaxation and threading dislocation density (TDD), calculated by SiLENSe. The results show that with a relaxation of 35% and TDD of 1×109 cm,2 assuming to fabricate the LED on the c-sapphire substrate, the carrier injection efficiency (CIE) increases as the number of QWs increases. In contrast, internal quantum efficiency (IQE) decreases due to a reduction in radiative recombination rate. For a 0-degree relaxation referred to as pseudomorphic growth with TDD of 1×104 cm-2, both CIE and IQE increase as the number of QWs are added due to the higher radiative recombination rate and reduced electron leakage.
Comment
To browse or post comments, you must log in.Log in