[15p-K404-1~18] 12.2 Characterization and Materials Physics

6:15 PM - 6:30 PM JST(9:15 AM - 9:30 AM UTC)

[15p-K404-17] Thermal diffusivity change by cross-linking reaction of chemically amplified resist SU-8

〇(B)Tomotake Naito¹, Ryouta Morioka¹, Meguya Ryu², Mizeikis Vygantas³, Junko Morikawa¹ (1.Science Tokyo, 2.AIST, 3.Shizuoka Univ.)

Keywords:

Thermal diffusivity,photoresist,Laser Direct Writing

Although SU-8 and other chemically amplified resists are important materials for the formation of high aspect ratio microstructures, few studies have investigated process optimization from the viewpoint of thermal properties. Therefore, in this study, SU-8 structures with varying UV irradiation doses were prepared using a 3D laser direct writing technique and measured by thermal wave analysis (TWA) using an AFM probe thermocouple, and a model of the SU-8 crosslinking structure formation process was discussed based on the measurement results obtained.