[16a-K305-1~8] 3.13 Silicon photonics, Photonics-electronics convergence, Optical control

9:00 AM - 9:15 AM JST(12:00 AM - 12:15 AM UTC)

[16a-K305-1] Development of fabrication technology for silicon photonic circuits using UV nanoimprint lithography

〇Shu Nagamatsu¹, Tomohiro Amemiya¹, Risako Mori², Yasushi Fujii², Takahiro Asai², Sho Okada³, Yuki Atsumi⁴, Dai Shiota², Lixin Xiang¹, Nobuhiko Nishiyama¹ (1.Science Tokyo, 2.tok, 3.NICT, 4.AIST)

Keywords:

NIL,silicon photonics process

Nanoimprint lithography (NIL) is expected to be one of the next-generation lithography technologies in semiconductor platforms because of its exposure wavelength-independent resolution, large-area transferability, and high throughput. In this study, by developing a photo-curable resin for NIL suitable for the silicon photonics process and optimizing the roll-on process, we succeeded in obtaining performance comparable to that of optical waveguides made using conventional CMOS prototype lines and electron beam lithography.