[16p-K203-1~10] Novel functional oxide materials, devices, techniques for next generation transistor channel application

5:35 PM - 5:40 PM JST(8:35 AM - 8:40 AM UTC)

[16p-K203-10] For the next 100 years

〇Hiroyuki Akinaga¹ (1.AIST-DTech)

Keywords:

semiconductor,transistor,oxide

In commemoration of the 100th anniversary of FETs, our symposium is held on topics related to next-generation transistors, focusing on oxide materials. How will transistor technology evolve over the next 100 years? Let's make a bold prediction.