Presentation Information

[16p-K507-13]Dependence of Reactive Gas Supply Method on Cryogenic Etching by GCIB Irradiation

〇(M1)Taichi Ito1, Seiya Kitanaka1, Masaya Takeuchi1, Noriaki Toyoda1 (1.Univ. of Hyogo)

Keywords:

gas cluster ion beam,cryoetching


Comment

To browse or post comments, you must log in.Log in