Presentation Information
[16p-K507-13]Dependence of Reactive Gas Supply Method on Cryogenic Etching by GCIB Irradiation
〇(M1)Taichi Ito1, Seiya Kitanaka1, Masaya Takeuchi1, Noriaki Toyoda1 (1.Univ. of Hyogo)
Keywords:
gas cluster ion beam,cryoetching
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