[16p-K507-1~14] CS.1 Code-sharing Session of 2.3 & 7.4

5:15 PM - 5:30 PM JST(8:15 AM - 8:30 AM UTC)

[16p-K507-14] Stress Control of Electron Transmission Windows Using O₂-GCIB Irradiation for Achieving High Spatial Resolution in Liquid X-ray PEEM Measurements

〇Masaya Takeuchi¹, Noriaki Toyoda¹ (1.Univ. of Hyogo)

Keywords:

Gas cluster ion beam,Silicon nitride,X-ray PEEM

In this study, we developed a stress control technique for silicon nitride (SiNx) membranes used in liquid cells with photoelectron transmission windows, aiming for operando analysis of liquids using X-ray Photoelectron Emission Microscopy (X-ray PEEM). SiNx membranes require ultrathin films and adequate tensile stress, but conventional stress relaxation methods have faced challenges in maintaining mechanical properties. This study examines a method to control the tensile stress of SiNx membranes while preserving their pressure resistance by employing low-damage irradiation with O2-GCIB.