Presentation Information

[17a-K305-6]Design of MOSFET on Standard Si Photonics for Suppression of Short-channel Effects

〇Yuto Miyatake1, Mitsuru Takenaka1, Makoto Ikeda1 (1.Univ. Tokyo)

Keywords:

Si Photonics,MOSFET,Photonic Integrated Circuits

Within the design rules of standard silicon photonics processes, the design of a side-gate MOSFET with a channel on the sidewall of the SOI layer was improved to suppress the short-channel effect. Based on simulation analysis, we successfully suppressed the short-channel effect and reduced the threshold voltage by making the source-drain junction shallower, introducing substrate doping directly under the channel, and inverting the polarity of the gate doping. We succeeded in increasing the drain current by shortening the channel length.

Comment

To browse or post comments, you must log in.Log in