[17a-K501-1~8] 6.3 Oxide electronics

11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[17a-K501-6] Fabrication and Characterization of SrTiO₃ Freestanding Films

〇(M1)Kosuke Tanaka^1,2, Hisashi Inoue², Masafumi Tamura¹, Isao H Inoue^1,2 (1.Tokyo Univ. of Science, 2.AIST)

Keywords:

freestanding film,pulsed laser deposition,complex oxide

Integration complex oxides into semiconductor devices is attractive for next-generation electronics technology. However, the high-temperature condition required for epitaxial growth of complex oxides pose a significant challenge to such integration. As an alternative approach, it has been reported that freestanding films of complex oxides can be transferred onto Si substrates by epitaxially grown complex oxides on a water-soluble sacrificial layer. In this presentation, we report methods to fabricate freestanding films of complex oxides SrTiO₃and discuss how the transfer process affects the physical properties of the freestanding films.