[17p-K101-1~12] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

3:15 PM - 3:30 PM JST(6:15 AM - 6:30 AM UTC)

[17p-K101-7] Another view of metal work function at M/S interface for Schottky barrier formation

〇Akira Toriumi¹, Tomonori Nishimura² (1.None, 2.Univ. Tokyo)

Keywords:

work function,semiconductor,Schottky barrier

We discuss another view of the metal work function for estimating the Schottky barrier at metal/semiconductor interface.