The 87th JSAP Autumn Meeting 2026

This symposium provides a comprehensive overview of atomic layer processes (ALP), including atomic layer deposition (ALD) and atomic layer etching (ALE), which are becoming increasingly important in advanced semiconductor device manufacturing, from both analytical and application perspectives.
The morning session will be conducted in English and will feature six presentations: three invited talks by international speakers on ALD and emerging materials for next-generation semiconductor devices, and three contributed talks on reaction analysis using approaches such as kinetic Monte Carlo (KMC) simulations and neural network potentials (NNPs).

This symposium provides a comprehensive overview of atomic layer processes (ALP), including atomic layer deposition (ALD) and atomic layer etching (ALE), which are becoming increasingly important in advanced semiconductor device manufacturing, from both analytical and application perspectives.
The afternoon session will be conducted in Japanese and will feature eight presentations: five invited talks and three contributed talks covering topics such as ALP applications to semiconductor devices, process informatics, and reaction analysis and process design using machine learning.