[15a-S4_203-1~11] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

9:45 AM - 10:00 AM JST(12:45 AM - 1:00 AM UTC)

[15a-S4_203-4] Application study of hydrogen-atmosphere surface-treatment using the Minimal laser heating tool to semiconductor CMOS devices(Ⅲ)

〇kazushige sato^1,2, Takashi Chiba^1,2, Masao Terada^1,2, Kengo Hamada^1,2, Yoshiaki Kanamori³, Noriko Miura⁴, Shinichi Ikeda⁴, Shiro Hara⁴ (1.MINIMAL, 2.SAKAGUCHI ELECTRIC HEATERS, 3.TOHOKU UNIV, 4.AIST)

Keywords:

laser heating

Siアイランド形成後に表面処理を施すことでMOSデバイスの信頼性をより向上できる見通しを得た