[15a-W8E_101-1~8] 13.3 Insulator technology

10:00 AM - 10:15 AM JST(1:00 AM - 1:15 AM UTC)

[15a-W8E_101-5] Ultrathin crystallized HfO₂/ZrO₂/HfO₂ films for high-k gate stacks in MOS structures

〇Takefumi Kamioka^1,2, Takamasa Kawanago^1,2, Yukinori Morita^1,2, Naoya Okada^1,2, Kenzo Manabe^1,2, Wataru Mizubayashi^1,2, Hiroyuki Ota^1,2, Takashi Matsukawa^1,2, Shinji Migita^1,2 (1.SFRC, AIST, 2.LSTC)

Keywords:

semiconductor,mos,high-k