Presentation Information

Symposium (Oral)Symposium : Atomic Layer Process (ALP) analysis and application technologies (3)

[15p-70A_101-1~13]Atomic Layer Process (ALP) analysis and application technologies (3)

Sun. Mar 15, 2026 1:30 PM - 6:00 PM JST
Sun. Mar 15, 2026 4:30 AM - 9:00 AM UTC

70A_101 (70th Anniversary Auditorium)

Chair : Fumihiko Hirose(Yamagata Univ.), Kazuhiro Karahashi(Nagoya Univ.), Shuji Azumo(Tokyo Electron Technology Solutions Ltd.)

In the afternoon, the program begins with two contributed presentations in English, followed by a Japanese session consisting of three invited talks and eight contributed talks. The invited talks will outline future directions of ALP, including its role in advanced 3D nanodevices, the development of high-purity gallium precursors for atomic layer deposition, and atomic-scale processing toward quantum applications. The contributed talks will showcase a broad range of recent results, from low-damage ALE, selective growth, and higher-throughput processing to reaction analysis and process optimization using approaches such as KMC and NNP.

2:00 PM - 2:30 PM JST(5:00 AM - 5:30 AM UTC)

[15p-70A_101-3]Atomic-Layer Process: Essential for 3D-Nano-Devices in Advanced LSIs

〇Hitoshi Wakabayashi¹ (1.Science Tokyo)

Keywords:

3D-Nano-Devices,Atomic-Layer Process

Atomic-Layer Process: Essential for 3D-Nano-Devices in Advanced LSIs

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