Presentation Information
[15p-W8E_307-11]Influence of defects in 4H-SiC epitaxial wafers on decay curves acquired by μ-PCD
〇Takumi Wakabayashi1,3, Kazushi Hayashi2, Hideo Fujii2, Naoki Okano3, Junji Senzaki1 (1.AIST, 2.Kobe Steel, LTD., 3.Kobelco Research Inst.)
Keywords:
semiconductor,SiC,carrier lifetime
Defect sites in a 4H-SiC epitaxial wafer were evaluated using the µ-PCD measurement, followed by detailed analysis of the decay curves. The analysis of decay curve behaviors for each defect type, taking into account both the structural characteristics of defects within the epitaxial layer and the carrier injection conditions, showed good agreement with the measurement results. This suggests that the approach is effective for structural characterization of individual defect types.
