Presentation Information
[16a-W8E_307-2]Observation of dislocation behavior at the seeding interface in CZ-Si crystal growth
〇Shoma Tsukada1, Hiroki Tsukada1, Hiroyuki Saito2, Hisashi Matsumura1,2, Takeshi Hoshikawa1, Toshinori Taishi1 (1.Shinshu Univ., 2.GlobalWafers Japan Co., Ltd.)
Keywords:
silicon,dislocation
