[16p-W9_222-1~11] Lab to Fab 2: Bridging Semiconductor Research with Scalable and Sustainable Manufacturing

5:00 PM - 5:15 PM JST(8:00 AM - 8:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[16p-W9_222-9] Operational Control of a High-speed Switching Valve Enabling Sustainable On-demand Precursor Delivery for ALD

〇(M1)Kanta Isida¹, Hiroshi Nishizato^1,2, Shota Oda¹, Yugo Nakaya², Kinichi Nasu⁴, Hiroshi Okajima³, Takeshi Momose⁴ (1.GSST, Kumamoto Univ., 2.HORIBA STEC, 3.FAST, Kumamoto Univ., 4.SE, Kumamoto Univ.)

Keywords:

Atomic Layer Deposition,Sustainable,Valve

ALD offers excellent conformality and precise thickness control, but the repeated precursor dosing and purge steps make the process time-consuming, and conventional approaches that continuously exhaust unused precursor lead to high cost and environmental burden. In this study, we introduced a high-speed piezoelectric valve and developed an on-demand precursor delivery scheme that dynamically controls the valve opening to rapidly ramp the precursor flow up to its target value.