[16p-WL2_101-1~11] 6.4 Thin films and New materials

4:00 PM - 4:15 PM JST(7:00 AM - 7:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[16p-WL2_101-10] Substrate Surface Roughness Influence on TiO₂ Optical Thin Films Fabricated Using a Combined Deposition Method

〇(M2)Takumi Kaneko¹, Matsudaira Takayuki², Murotani Hiroshi¹ (1.Tokai Univ., 2.SHINCRON Co., Ltd.)

Keywords:

optical thin film,titanium dioxide

The substrate surface roughness dependence of TiO₂ thin films prepared by a combined deposition method using EB evaporation and DC pulse sputtering was investigated. As a result, the combined deposition films exhibited a weaker dependence of the post-deposition surface roughness Ra on the substrate surface roughness compared with EB-evaporated films. On the other hand, the forward light scattering intensity increased with increasing substrate surface roughness and showed higher values for the combined deposition films, suggesting that the light scattering characteristics cannot be sufficiently explained by the average surface roughness Ra alone.