Session Details

[16p-WL2_101-1~11]6.4 Thin films and New materials

Mon. Mar 16, 2026 1:30 PM - 4:30 PM JST
Mon. Mar 16, 2026 4:30 AM - 7:30 AM UTC
WL2_101 (West Lecture Bldg. 2)

[16p-WL2_101-1]Micro-Scale AlN 2D Grating Structures for Boosting the Polar Magneto-Optical Kerr Effect of CoPt Thin Films

〇(D)Kejia Zhang1, Ao Sun1, Zihao Song1, Kai Chen1, Jundong Song1, Takumi Sannomiya1, Zhengjun Zhang2, Takashi Harumoto1, Ji Shi1 (1.Science Tokyo, 2.Tsinghua Univ.)

[16p-WL2_101-2]Thickness dependence of electrical transport in Zintl-phase EuGe2 films

〇Makoto Ushio1, Tsukasa Terada2, Atsushi Tsukazaki1 (1.Dept. Appl. Phys. The Univ. of Tokyo, 2.Grad. School of Eng. Sc. The Univ. of Osaka)

[16p-WL2_101-3]Self-formation of atomically flat step-terrace structures in SrRuO3 thin films grown on non-pretreated SrTiO3(100) substrates

〇(M2)Ryotaro Arakawa1, Sachio Komori1, Masaaki Tanaka2, Tomoyasu Taniyama1 (1.Nagoya Univ., 2.Nagoya Inst. Tech.)

[16p-WL2_101-4]High-Performance Flexible Transparent Conductive Films Based on Ag Nanowire/PDMS via Thermal-Assisted Multilayer Coating

〇(D)Yutong Jia1, Tso-Fu Mark Chang2, Masato Sone2, Wan-Ting Chiu1 (1.SCIENCE TOKYO, 2.IIR, SCIENCE TOKYO)

[16p-WL2_101-5]Formation of Nanostructured Molybdenum Oxide Thin Films on Laser-Induced Graphene using Metal-Organic Decomposition

〇(D)Akihiro Katsura1, Otoya Okanishi1, Yukiko Hirose1, Yuma Miura1, Wenliang Zhu1, Tohru Sugahara1 (1.Kyoto Inst. Univ.)

[16p-WL2_101-6]Synthesis of Silver Nanoparticles on UV-PDMS Substrates for SERS Properties

〇(B)Shu Kawamura1, Aoi Igari1, Ryo Shoji1, Mikio Ito1, Lina Yoshida1 (1.Natl. Inst. Tech, Tokyo Col.)

[16p-WL2_101-7]Light-programmable reorientation of the crystallographic c axis of Tellurium thin films

〇Yuta Kobayashi1, Arata Mitsuzuka1, Haruo Kondo1, Makoto Shoshin1, Jun Uzuhashi2, Tadakatsu Ohkubo2, Masamitsu Hayashi1, Masashi Kawaguchi1 (1.Univ. Tokyo, 2.NIMS)

[16p-WL2_101-8]Synthesis and optical characterization of oxyhydroxide AlOOH thin films

〇Takuro Sekiguchi1, Takuto Soma1, Kohei Yoshimatsu1, Akira Ohtomo1 (1.Science Tokyo)

[16p-WL2_101-9]Reaction in ε-Ga2O3 Formation by ALD processes with a Dialkylamido-Based Precursor

〇(B)Shodai Shinkai1, Sho Nakosai1, Ichiro Hayamizu1, Tomoki Otani2, Hideaki Machida3, Atsushi Ogura2, Yoshio Ohshita1, Toshinori Numata1 (1.Toyota Tech. Inst., 2.Meiji univ., 3.Gas-Phase Growth)

[16p-WL2_101-10]Substrate Surface Roughness Influence on TiO2 Optical Thin Films Fabricated Using a Combined Deposition Method

〇(M2)Takumi Kaneko1, Matsudaira Takayuki2, Murotani Hiroshi1 (1.Tokai Univ., 2.SHINCRON Co., Ltd.)

[16p-WL2_101-11]Sputter Deposition of Fluorides and Oxyfluorides

〇Yohei Sakano1, Ryosuke Sugawara1, Yuma Sugai1, Yasuhito Tanaka1, Shinichiro Saisyo1, Takuya Sugawara1 (1.SHINCRON)