[17a-M_103-1~13] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

12:15 PM - 12:30 PM JST(3:15 AM - 3:30 AM UTC)

[17a-M_103-13] Method for Gas Dissociation Efficiency Enhancement in Microwave ECR Plasma

〇Mamoru Yakushiji¹, Kenichi Kuwahara¹, Masaki Yamada² (1.Hitachi High-Tech Corp., 2.Hitachi, Ltd. R&D Group)

Keywords:

GHG reduction,Microwave ECR plasma,Dissociation efficiency

In this study, we aim to reduce Greenhouse Gas (GHG) emissions by evaluating the dissociation efficiency of process gases using microwave Electron Cyclotron Resonance (ECR) plasma. Exhaust gas components from a plasma etching system were monitored in real time with a Fourier-Transform Infrared Spectrometer (FTIR), and the dependence on microwave power was systematically investigated. The results confirmed that increasing microwave power significantly enhances gas dissociation. In addition, alternative approaches, underlying dissociation mechanisms, and their potential effectiveness in reducing environmental impact are discussed, providing valuable insights for future process development.