Presentation Information
[17a-S2_201-10]Impact of CF4/H2 Plasma Exposure on Surface Reactions of Si and Si0.7Ge0.3
〇(M1)Ibuki Saburi1, Kotaro Ozaki1, Yuki Imai1, Takayoshi Tsutsumi2, Kenji Ishikawa2, Yuji Yamamoto3,1, Wei-Chen Wen3, Katsunori Makihara1,3 (1.Nagoya Univ. Eng., 2.Nagoya Univ. cLPS, 3.Leibniz Institute for High Performance Microelectronics)
Keywords:
CF4/H2 plasma