Session Details
[17a-S2_201-1~13]13.4 Si processing /Si based thin film / MEMS / Equipment technology
Tue. Mar 17, 2026 9:00 AM - 12:45 PM JST
Tue. Mar 17, 2026 12:00 AM - 3:45 AM UTC
Tue. Mar 17, 2026 12:00 AM - 3:45 AM UTC
S2_201 (South Bldg. 2)
[17a-S2_201-1]Mechanical Tolerance Evaluation of Gold Single-Axis MEMS Accelerometer by Long-Term Vibration Testing
〇Torauto Yamada1, Chihaya Mukaide1, Tomoyuki Kurioka1, Katsuyuki Machida1, Chun-Yi Chen1, Tso-Fu Mark Chang1, Masato Sone1, Yoshihiro Miyake1, Hiroyuki Ito1 (1.Science Tokyo)
[17a-S2_201-2]Evaluation of Detection Characteristics in Wide Range Gold Proof-Mass Single-Axis MEMS Capacitive Accelerometer
〇Chihaya Mukaide1, Torauto Yamada1, Tomoyuki Kurioka1, Katsuyuki Machida1, Chun-Yi Chen1, Tho-Fu Mark Chang1, Yoshihiro Miyake1, Masato Sone1, Hiroyuki Ito1 (1.Science Tokyo)
[17a-S2_201-3]Fabrication of Au/Nylon Composite Fibers via Supercritical CO2-Assisted Catalyzation
〇(M1)RONGWEI XU1, Takumi Suda1, Tomoyuki Kurioka1, Wan-Ting Chiu1, Chun-Yi Chen1, Tso-Fu Mark Chang1, Katsunari Sato2, Nao Yoshida2, Hiromichi Kurosu2, Masato Sone1 (1.Science Tokyo, 2.NWU)
[17a-S2_201-4]Evaluation of the Influences of Ti/Au Thickness on Spring Constants of Ti/Au-Multi-Layered Serpentine Springs
〇Hisashi Takahata1, Tomoyuki Kurioka1, Torauto Yamada1, Chihaya Mukaide1, Katsuyuki Machida1, Chun-Yi Chen1, Tso-Fu Mark Chang1, Yoshihiro Miyake1, Hiroyuki Ito1, Masato Sone1 (1.Science Tokyo)
[17a-S2_201-5]Effect of Annealing on Mechanical Properties of Electroplated Gold Films on Ti Plate
〇Nobutaka Toake1, Tomoyuki Kurioka1, Shota Iima1, Katsuyuki Machida1, Chun-Yi Chen1, Tso-Fu Mark Chang1, Hiroyuki Ito1, Yoshihiro Miyake1, Masato Sone1 (1.Science Tokyo)
[17a-S2_201-6]Evaluation of Structures and Device Characteristics of Single-axis MEMS capacitive Accelerometer with Gold Circular Proof-mass
〇Masako Okumura1, Tomoyuki Kurioka1, Torauto Yamada1, Tatsuhiko Mori1, Chihaya Mukaide1, Chun-Yi Chen1, Tso-Fu Mark Chang1, Yoshihiro Miyake1, Hiroyuki Ito1, Katsuyuki Machida1, Masato Sone1 (1.Science Tokyo)
[17a-S2_201-7]Substrate-Dependent Ruthenium Electrodeposition for Interconnect Applications
〇(D)Zhitao Hu1, Kurioka Tomoyuki1, Yung-Jung Hsu1,2, Tso-Fu Mark Chang1, Katsuyuki Machida1, Hiroyuki Ito1, Miyake Yoshihiro1, Masato Sone1 (1.Science Tokyo, 2.NYCU)
[17a-S2_201-8][The 47th Paper Award Speech] Ge-on-Insulator Fabrication based on Ge-on-Nothing Technology
〇Keisuke Yamamoto1,2, Dong Wang2, Roger Loo3,4, Clement Porret3, Jinyoun Cho5, Kristof Dessein5, Valerie Depauw3 (1.Kumamoto Univ., 2.Kyushu Univ., 3.imec, 4.Ghent Univ., 5.Umicore)
[17a-S2_201-9][The 47th Young Scientist Award Speech] Formation and contact resistivity of Sc germanosilicides on Si1-xGex:B
〇Bert Pollefliet1,2, Clement Porret2, Jean-Luc Everaert2, Kiroubanand Sankaran2, Olivier Richard2, Thierry Conard2, Han Han2, Anja Vanleenhove2, Roger Loo2,3, Christophe Detavernier3, Andre Vantomme1, Clement Merckling1,2 (1.KU Leuven, 2.imec, 3.Ghent Univ.)
[17a-S2_201-10]Impact of CF4/H2 Plasma Exposure on Surface Reactions of Si and Si0.7Ge0.3
〇(M1)Ibuki Saburi1, Kotaro Ozaki1, Yuki Imai1, Takayoshi Tsutsumi2, Kenji Ishikawa2, Yuji Yamamoto3,1, Wei-Chen Wen3, Katsunori Makihara1,3 (1.Nagoya Univ. Eng., 2.Nagoya Univ. cLPS, 3.Leibniz Institute for High Performance Microelectronics)
[17a-S2_201-11]Dry Etching of Epitaxially Grown Si0.7Ge0.3 Using HBr Plasma
〇Sota Ishii1, Kotaro Ozaki2, Eita Yano1, Ibuki Saburi2, Yuki Imai1, Takayoshi Tsutsumi3, Kenji Ishikawa3, Yuji Yamamoto4,2, Wei-Chen Wen4, Katsunori Makihara2,4 (1.Nagoya Univ, 2.Nagoya Univ. Eng, 3.Nagoya Univ. cLPS, 4.IHP)
[17a-S2_201-12]Ni-thickness Dependence of Ultrathin a-Si/Ni/SOI Structures on Silicidation Reaction
〇Syogo Adachi1, Yuki Imai1, Takumi Washioka1, Noriyuki Taoka3, Katsunori Makihara1,2 (1.Nagoya Univ. Eng., 2.IHP, 3.Aichi Inst. Tech. Eng.)
[17a-S2_201-13]Impact of Annealing Temperature for Ultrathin Si/Ni/Si Stacked Layers
on Silicidation Reactions
〇Takumi Washioka1, Yuki Imai1, Shogo Adachi1, Ibuki Saburi1, Noriyuki Taoka2, Kotaro Ozaki1, Katsunori Makihara1,3 (1.Nagoya Univ. Eng., 2.Aichi Inst. Tech. Eng., 3.IHP)
