[17a-S2_201-1~13] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

12:30 PM - 12:45 PM JST(3:30 AM - 3:45 AM UTC)

[17a-S2_201-13] Impact of Annealing Temperature for Ultrathin Si/Ni/Si Stacked Layers
on Silicidation Reactions

〇Takumi Washioka¹, Yuki Imai¹, Shogo Adachi¹, Ibuki Saburi¹, Noriyuki Taoka², Kotaro Ozaki¹, Katsunori Makihara^1,3 (1.Nagoya Univ. Eng., 2.Aichi Inst. Tech. Eng., 3.IHP)

Keywords:

Silicide,SOI