[17a-S4_202-1~10] 7.3 Micro/Nano patterning and fabrication

9:15 AM - 9:30 AM JST(12:15 AM - 12:30 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[17a-S4_202-2] Development characteristics of PMMA electron beam resist using alkyl acetate and IPA mixture

〇Natsuko Hori¹, Yukiko Kishimura¹, Hironori Asada¹ (1.Yamaguchi Univ.)

Keywords:

PMMA,developer

A mixture of MIBK and IPA is the standard developer for PMMA. We focus on alkyl acetate as a safer developer than MIBK. In this study, we have investigated development characteristics of PMMA such as sensitivity and CD linearity by using alkyl acetate and IPA mixtures. Although IPA is used as a poor solvent in MIBK/IPA developers, the increase of sensitivity is observed for alkyl acetate/IPA developers with several tens of percentage IPA.