The 73rd JSAP Spring Meeting 2026
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Session Details

Oral presentation7 Beam Technology and Nanofabrication : 7.3 Micro/Nano patterning and fabrication

[17a-S4_202-1~10]7.3 Micro/Nano patterning and fabrication

Tue. Mar 17, 2026 9:00 AM - 11:45 AM JST
Tue. Mar 17, 2026 12:00 AM - 2:45 AM UTC
S4_202 (South Bldg. 4)
9:00 AM - 9:15 AM JST(12:00 AM - 12:15 AM UTC)

[17a-S4_202-1]Investigation into High-Speed Control of Optical-Fiber Matrix Exposure

〇Toshiyuki Horiuchi1, Yuta Suzuki1, Jun-ya Iwasaki1, Akira Yanagida1, Hiroshi Kobayashi1 (1.Tokyo Denki Univ.)
9:15 AM - 9:30 AM JST(12:15 AM - 12:30 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[17a-S4_202-2]Development characteristics of PMMA electron beam resist using alkyl acetate and IPA mixture

〇Natsuko Hori1, Yukiko Kishimura1, Hironori Asada1 (1.Yamaguchi Univ.)
9:30 AM - 9:45 AM JST(12:30 AM - 12:45 AM UTC)

[17a-S4_202-3]La/B4C Reflective Multilayer Films Dependence on Ar+ Acceleration Voltage

〇Takeo Ejima1, Nakano Ryuki1, Ryosuke Nakamura1, Tadashi Hatano1 (1.Tohoku Univ.)
9:45 AM - 10:00 AM JST(12:45 AM - 1:00 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[17a-S4_202-4]Investigation of Quantitative Evaluation of Shear Phenomena in Organic Nano Thin Films (Ⅱ): Focusing on Evaluating Voids using Persistent Homology

〇(B)Shima Ishisaki1, Kazuhiro Tada1 (1.NIT, Toyama Coll.)
10:00 AM - 10:15 AM JST(1:00 AM - 1:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[17a-S4_202-5]Nanoimprint lithography process employing a three-dimensional resist master mold fabricated via electron-beam grayscale exposure

〇Shu Nagamatsu1, Towa Maekawa1, Yahui Wang1, Lixin Xiang1, Jooyeon Lee2, Kensuke Otsuka2, Hiroshi Miyao2, Tomohiro Amemiya1 (1.Science Tokyo, 2.Mitsui Chemicals)
10:30 AM - 10:45 AM JST(1:30 AM - 1:45 AM UTC)

[17a-S4_202-6]Fabrication of Slanted Structures Using Electron Beam Lithography

〇Kensuke Niwa1, Jun Taniguchi1 (1.Tori Univ.)
10:45 AM - 11:00 AM JST(1:45 AM - 2:00 AM UTC)

[17a-S4_202-7]Fundamental study of a stepwise dimming blind using nano-structured polarizers

〇Ryohei Hokari1, Genki Kuwano1, Kazuma Tsujioka1, Kazuma Kurihara1 (1.AIST)
11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)

[17a-S4_202-8]Residual-Layer-Free Nanopatterning Using a Replica Mold with a Light-Shielding Layer

〇Yutaro Moriyama1, Jun Taniguchi1 (1.Touri Univ.)
11:15 AM - 11:30 AM JST(2:15 AM - 2:30 AM UTC)

[17a-S4_202-9]Morphological characterization of fluorescent resist patterns possessing micro-bar arrays for alignment and a nano-disk array fabricated by microprint and nanoimprint method

〇Daisuke Tojima1, Narumi Ono1, Akiko Onuma1, Masaru Nakagawa1 (1.IMRAM, Tohoku Univ.)
11:30 AM - 11:45 AM JST(2:30 AM - 2:45 AM UTC)

[17a-S4_202-10]Adhesive Superhydrophobic Surface Based on Hybridized Moth-Eye Structures and Microholes

〇Yuu Sumita1, Jun Taniguchi1 (1.Touri Univ.)
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