[17a-S4_202-1~10] 7.3 Micro/Nano patterning and fabrication

10:00 AM - 10:15 AM JST(1:00 AM - 1:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[17a-S4_202-5] Nanoimprint lithography process employing a three-dimensional resist master mold fabricated via electron-beam grayscale exposure

〇Shu Nagamatsu¹, Towa Maekawa¹, Yahui Wang¹, Lixin Xiang¹, Jooyeon Lee², Kensuke Otsuka², Hiroshi Miyao², Tomohiro Amemiya¹ (1.Science Tokyo, 2.Mitsui Chemicals)

Keywords:

NIL,grayscale,AR glasses

Recent years have seen increasing demand for 3D optical elements used in applications such as lightguides for augmented reality (AR) glasses. Conventional mold fabrication for nanoimprinting faces challenges in terms of cost and time due to complex etching processes. In this study, we fabricated a 3D master mold directly from a photopolymer using electron-beam grayscale exposure. This approach achieved successful transfer of the designed pitch and slant angle onto glass substrates, and is expected to contribute to significant process simplification.