[17a-S4_202-1~10] 7.3 Micro/Nano patterning and fabrication

11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)

[17a-S4_202-8] Residual-Layer-Free Nanopatterning Using a Replica Mold with a Light-Shielding Layer

〇Yutaro Moriyama¹, Jun Taniguchi¹ (1.Touri Univ.)

Keywords:

nanoimprint,transfer,residual layer