Presentation Information
[17a-S4_203-1]Investigation of structural evaluation methods for amorphous SiO2 thin films on Si substrates using X-ray and electron PDF analysis
〇Takanori Itoh1, Shusaku Ogyu1, Toshihiro Asada1, Yuji Shiramata2,3, Koji Ohara3 (1.NISSAN ARC, LTD., 2.Rigaku, 3.Shimane Univ.)
Keywords:
amorphous thin films,PDF analysis,Grazing-incidence X-ray diffraction
Functional thin films are widely used in semiconductor devices, optical materials, and various coating applications. In particular, amorphous thin films, while lacking long-range order, exhibit diverse structures depending on their local atomic arrangements and fabrication processes, and have therefore attracted considerable attention in relation to their functional properties. However, structural analysis of amorphous thin films is not straightforward due to substrate-derived scattering and limitations in measurement conditions. In recent years, pair distribution function (PDF) analysis based on total scattering data has emerged as an effective approach for evaluating short-range order in amorphous materials. In this study, X-ray total scattering PDF measurements were first performed on a SiO2 glass plate using in-plane and out-of-plane geometries to examine measurement methods suitable for thin-film evaluation. The optimized measurement approach was then applied to amorphous SiO2 thin films on Si substrates for structural analysis. Furthermore, local structural differences between the film surface region and the substrate interface were investigated by PDF analysis using electron diffraction. By combining X-ray and electron PDF analyses, a comprehensive structural evaluation method for amorphous SiO2 thin films was examined.