[17p-M_103-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

5:00 PM - 5:15 PM JST(8:00 AM - 8:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[17p-M_103-12] Steering Control of Cathode Spot for Efficient Cathode Utilization in High-Rate Vacuum Arc Evaporation Systems for TiN Film Formation

〇Shogo Ochi¹, Mirano Oneda¹, Genki Sano¹, Haru Sano¹, Hirofumi Takikawa¹, Takahiro Hattori², Hiroki Gima² (1.Toyohashi Univ. Technol., 2.OSG Corp.)

Keywords:

TiN,vacuum arc deposition,steered arc method

In the HR-FAD system for high-speed TiN film deposition, we investigated the control of the cathode point's orbit radius and orbit speed during steering. By varying the current in the outer coil electromagnet and visualizing the cathode point's motion, we demonstrated that controlling the magnetic field distribution enables both a reduction in orbit radius and an increase in orbit speed. This indicates the potential for temporal control to enhance cathode utilization.