[17p-M_103-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

2:15 PM - 2:30 PM JST(5:15 AM - 5:30 AM UTC)

[17p-M_103-2] Electronic properties and dissociation channels of CF₃CHFCHF₂ molecule

〇Toshio Hayashi¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (1.Nagoya Univ.)

Keywords:

CF3CHFCHF2,Etching gas,Primarily dissociation process

Primarily Dissociation routes are discussed by using computational chemistry. Briefly summarized, many CHF ions including CF₃⁺ are predominantly produced around at the vertical ionization region (12.8 eV) and CHF=CHF⁺ ionization is produced in the higher energy region at 14.4 eV . In the excitation process, CF₃CHFCHF₂ predominantly dissociates to C₃H₂F₅ + F at the C-F bonds.