[17p-M_103-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

2:30 PM - 2:45 PM JST(5:30 AM - 5:45 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[17p-M_103-3] Dry Etching Simulation Using Machine Learning Potentials

〇Kei Ikeda¹ (1.Mitsubishi Chemical Corporation)

Keywords:

Machine Learning Potentials,Molecular Dynamics Simulation,Etching

This research utilizes Machine Learning Potentials (MLPs), which output physical properties like energy through machine learning inference, to perform reaction dynamics simulations