[17p-M_103-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

3:00 PM - 3:15 PM JST(6:00 AM - 6:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[17p-M_103-5] Unveiling the intrinsic stress formation mechanism of hydrogenated amorphous carbon films (a-C:H) through data-driven analysis of ab-initio molecular dynamics study

〇Yusuke Ando¹, Hu Li², Jianping Zhao², Masaaki Matsukuma³, Peter Ventzek², Kenji Ishikawa⁴ (1.Nagoya Univ. Eng., 2.Tokyo Electron America, Inc., 3.Tokyo Electron Technology Solutions Ltd., 4.Nagoya Univ. cLPS)

Keywords:

amorphous carbon,stress,density functional theory

The stress generation mechanisms in hydrogenated amorphous carbon were elucidated by quantitatively identifying geometrical parameters affecting stress through the data-driven analysis. Several carbon structures were modeled using ab initio molecular dynamics to discuss the relationship between the structure and stress.