[17p-M_103-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

3:45 PM - 4:00 PM JST(6:45 AM - 7:00 AM UTC)

[17p-M_103-7] Quantitative Assessment of Plasma Processes Based on Diversity Metrics

〇Masaharu Shiratani¹, Sukma Fitriani¹, Kunihiro Kamataki¹ (1.Kyushu Univ.)

Keywords:

Hill numbers,plasma process,diversity

Optimization of plasma processes in semiconductor manufacturing is strongly influenced by the diversity of reactive species. Nevertheless, conventional methodologies have lacked robust quantitative metrics to characterize this diversity, thereby hindering systematic process comparison and the development of rational exploration strategies. In this study, we introduce a novel approach for quantifying the diversity of radical and emission species within plasma by leveraging Hill numbers, a well-established metric in ecological research.